Course unit title Level of course unit Course unit code Type of course unit Semester of course unit Local credit ECTS credit Syllabus
METAL-SEMICONDUCTOR CONTACTS Second cycle FİZ 694 2 7.50 7.50 Print
   
Description of course unit
Prerequisites and course requisities Semiconductor Physics
Language of instruction Turkish
Coordinator PROF. DR. ENİSE AYYILDIZ
Lecturer(s) PROF. DR. ENİSE AYYILDIZ
Teaching assitant(s) None
Mode of delivery Face to facew
Course objective The aim of this course is to give the knowledge about the formation mechanisms of the metal-semiconductor contacts, their electrical characteristics and technological significance.
Course description The formation of a Schottky barrier, methods of measurement of barrier height, current-transport mechanisms, the capacitance of a Schottky barrier, methods of manufacture, the effect of pressure and heat treatment on contacts.

Course contents
1 Surfaces, interfaces and Schottky barriers
2 The formation of a Schottky barrier
3 Methods of measurement of barrier heights
4 Metal contacts on silicon and germanium; etched and oxidized silicon surfaces
5 Metal contacts on III-V semiconductors; gallium arsenide (GaAs) and indium phosphide (InP)
6 Current-transport mechanisms; thermionic emission theory, diffusion theory
7 Current-transport mechanisms;recombination in the depletion region, tunnelling through the barrier
8 Reverse characteristics, transient effect
9 The capacitance of a Schottky barrier, C/V methods of measuring dopant distributions
10 Methods of manufacture; point contacts, evaporated contacts, sputtered contacts, chemical deposition
11 Oxidation of silicon and III-V compound semiconductors
12 Surface passivation by adsorbates and surfactans
13 Laterally inhomogeneous Schottky contacts
14 Temperature and high-pressure effects on the electrical characteristics
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Learning outcomes of the course unit
1 Understand mechanisms of barrier formation in metal-semiconductor contacts
2 Identify and explain the difference between an ohmic and rectifying contact.
3 Describe the role of interfacial microstructure in contact performance and reliability.
4 Discusses the current-transport mechanisms at metal-semiconductor contacts.
5 Determine the characteristic diode parameters.
6 Understand the important of metal-semiconductor contacts in the technology.
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*Contribution level of the course unit to the key learning outcomes
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Number of stars refer to level of contribution from 1 (the least) to 5 (the most)

Planned learning activities, teaching methods and ECTS work load
  Quantity Time (hour) Quantity*Time (hour)
Lectures (face to face teaching) 14 3 42
Study hours out of classroom (study before and after the class) 14 2 28
Homework 7 5 35
Presentation / seminar 1 10 10
Quiz 0 0 0
Preparation for midterm exams 1 20 20
Midterm exams 1 2 2
Project (term paper) 1 20 20
Laboratuar 0 0 0
Field study 0 0 0
Preparation for final exam 1 25 25
Final exam 1 2 2
Research 0 0 0
Total work load     184
ECTS     7.50

Assessment methods and criteria
Evaluation during semester Quantity Percentage
Midterm exam 2 65
Quiz 0 0
Homework 7 35
Semester total   100
Contribution ratio of evaluation during semester to success   40
Contribution ratio of final exam to success   60
General total   100

Recommended and required reading
Textbook 1. Rhoderick, E. H., Williams,R. H., Metal-Semiconductor Contacts, Clarendon Press, Oxford, 1988. 2. Brillson, L. J, Contacts to Semiconductors, Noyes publications, New York, 1993.
Additional references 1. Mönch, W., Semiconductor Surface and Interface, Springer, Berlin, 2001. 2. Sze,S. M.,Ng, K. K., Physics of Semiconductor Devices , John Wiley&Sons, NewJersey, 2007.

Files related to the course unit